New Student Early Wave Registration is Open !!
New Student Early Wave Registration for the 2022/2023 Academic Year is Open
Solo – New Student Admission for the Academic Year 2022/2023 Polytechnic Indonusa Surakarta has been opened for an early wave. New student admission for the early wave period will be on October 1, 2021 until February 28, 2022.
The benefits that new students will get in the early wave include:
Free selection test
50% reduction in Institutional Development Fund (DPI) fees for Study Programs:
D3 Communication
D3 Information System
D3 Automotive Technology
25% reduction in Institutional Development Fund (DPI) fees for Study Programs:
D3 Hospitality
D3 Pharmacy
Bachelor of Applied Health Information Management (Medical Records)
For new students who apply for scholarships have a greater chance of passingPolytechnic Indonusa Surakarta is the best vocational campus in Indonesia which is located in the city of Solo / Surakarta. It has 2 campuses, campus 1 is located at Jl. K.H. Samanhudi No.31 Mangkuyudan, Laweyan, Surakarta and campus 2 is located at Jl. Palm No. 08 Cemani, Grogol, Sukoharjo.
Polytechnic Indonusa Surakarta has 6 Study Programs, including:
D3 Communication accredited B
D3 Information Systems accredited B
D3 Automotive Technology accredited B
D3 Hospitality accredited A
D3 Pharmacy accredited B
Accredited Bachelor of Applied Health Information Management (Medical Record) GoodPolytechnic Indonusa Surakarta also makes it easier for new students who want to study while working, by providing a choice of Morning, Evening, RPL, and Transfer classes.
Registration can be done online at spmb.poltekindonusa.ac.id, by filling in the registration form in the system, after the data is sent, new prospective students will get a notification for payment of the registration fee. In addition, it also serves offline registration on campus 1 Polytechnic Indonusa Surakarta with the obligation to comply with prokes. For further information, please contact admin +62 812-3069-0006.
SOLO LECTURE?
POLINUS ONLY….
